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Equipamento de sala limpa específico da indústria

Z Semicondutor Mini-ambiente

A compact process enclosure that creates a localized clean-air zone around sensitive semiconductor handling or inspection operations.
  • Localized HEPA Airflow
  • Transparent Process Access
  • Low-Shedding Construction
  • Configurable Tool Interface
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Introdução do produto

The semiconductor mini-environment combines an anodized aluminum frame, clear enclosure panels, an overhead fan-filter module and a cleanable stainless work deck. It separates the protected process zone from surrounding room traffic while preserving direct visibility and controlled operator access. Service panels, utility penetrations and equipment interfaces can be arranged around the installed tool, wafer handler or inspection fixture.

Características-chave

Overhead filtered airflow continuously sweeps the protected work zone.

Clear panels maintain process visibility while limiting uncontrolled room-air entry.

Smooth metal work surfaces and low-shedding frame components support routine cleaning.

Modular access, controls and utility penetrations adapt to the enclosed process equipment.

Preocupações do produto do cliente

Localized wafer operations need stable cleanliness without enclosing an entire production bay to the same stringent conditions.

Room traffic can carry particles toward an exposed wafer-handling step.A filtered vertical airflow zone and physical enclosure shield the critical process area.
Opaque guards make it difficult to observe equipment and material status.Clear access panels preserve visibility from multiple sides without opening the enclosure.
A fixed enclosure can conflict with tool service and utility connections.Modular framing allows service doors, removable panels and penetrations to follow the actual tool layout.
Broad shadows and inaccessible corners complicate cleaning inspection.Smooth work surfaces and an open, visible internal layout reduce hidden residue traps.

Aplicações típicas

Wafer inspection and metrologySemiconductor assembly operationsSensitive substrate handlingTool loading and process isolation

Parâmetros técnicos

Typical construction values for a modular semiconductor mini-environment are listed below.

Material principalAnodized aluminum frame with clear polycarbonate panels and stainless steel work surfaces
Painel de espessura6-10 Painel de encapsulação transparente mm
Largura efetiva1200-2400 mm process enclosure width
Comprimento máximoUp to 3000 mm modular enclosure length
Aço enfrentando espessura1.0-1.5 mm stainless steel work and cabinet panels
Densidade Core2700 kg/m³ for aluminum framing and 7850-8000 kg/m³ for stainless components
Condutividade térmica14-17 W/(m·K) for stainless work surfaces
Superfície acabadoNatural anodized aluminum, clear glazing and brushed stainless steel
Tipo conjuntoBolted modular extrusion joints with gasketed removable access panels
CustomizaçãoDisponível com base na aplicação pretendida e no ambiente operacional.

Opções disponíveis

HEPA or ULPA terminal filtrationSliding or hinged access panelsIonization and task lightingTool-specific utility penetrations

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