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Branchenspezifische Reinraumausrüstung

Semiconductor Mini-Umgebung

A compact process enclosure that creates a localized clean-air zone around sensitive semiconductor handling or inspection operations.
  • Localized HEPA Airflow
  • Transparent Process Access
  • Low-Shedding Construction
  • Configurable Tool Interface

Produkteinführung

The semiconductor mini-environment combines an anodized aluminum frame, clear enclosure panels, an overhead fan-filter module and a cleanable stainless work deck. It separates the protected process zone from surrounding room traffic while preserving direct visibility and controlled operator access. Service panels, utility penetrations and equipment interfaces can be arranged around the installed tool, wafer handler or inspection fixture.

Key Features

Overhead filtered airflow continuously sweeps the protected work zone.

Clear panels maintain process visibility while limiting uncontrolled room-air entry.

Smooth metal work surfaces and low-shedding frame components support routine cleaning.

Modular access, controls and utility penetrations adapt to the enclosed process equipment.

Kunden Produktbedenken

Localized wafer operations need stable cleanliness without enclosing an entire production bay to the same stringent conditions.

Room traffic can carry particles toward an exposed wafer-handling step.A filtered vertical airflow zone and physical enclosure shield the critical process area.
Opaque guards make it difficult to observe equipment and material status.Clear access panels preserve visibility from multiple sides without opening the enclosure.
A fixed enclosure can conflict with tool service and utility connections.Modular framing allows service doors, removable panels and penetrations to follow the actual tool layout.
Broad shadows and inaccessible corners complicate cleaning inspection.Smooth work surfaces and an open, visible internal layout reduce hidden residue traps.

Typische Anwendungen

Wafer inspection and metrologySemiconductor assembly operationsSensitive substrate handlingTool loading and process isolation

Technische Parameter

Typical construction values for a modular semiconductor mini-environment are listed below.

Core MaterialAnodized aluminum frame with clear polycarbonate panels and stainless steel work surfaces
Panel Dicke6-10 mm Transparente Gehäuse Panels
Effektive Breite1200-2400 mm process enclosure width
Maximale LängeUp to 3000 mm modular enclosure length
Stahl facing Dicke1.0-1.5 mm stainless steel work and cabinet panels
Kerndichte2700 kg/m³ for aluminum framing and 7850-8000 kg/m³ for stainless components
Thermische Leitfähigkeit14-17 W/(m·K) for stainless work surfaces
Oberfläche FinishNatural anodized aluminum, clear glazing and brushed stainless steel
Gemeinsamer TypBolted modular extrusion joints with gasketed removable access panels
CustomisierungVerfügbar je nach beabsichtigter Anwendung und Betriebsumgebung.

Verfügbare Optionen

HEPA or ULPA terminal filtrationSliding or hinged access panelsIonization and task lightingTool-specific utility penetrations

Planning a Semiconductor Mini-Environment specification?

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