Semiconductor Mini-Umgebung
- Localized HEPA Airflow
- Transparent Process Access
- Low-Shedding Construction
- Configurable Tool Interface
Produkteinführung
The semiconductor mini-environment combines an anodized aluminum frame, clear enclosure panels, an overhead fan-filter module and a cleanable stainless work deck. It separates the protected process zone from surrounding room traffic while preserving direct visibility and controlled operator access. Service panels, utility penetrations and equipment interfaces can be arranged around the installed tool, wafer handler or inspection fixture.
Key Features
Clear panels maintain process visibility while limiting uncontrolled room-air entry.
Smooth metal work surfaces and low-shedding frame components support routine cleaning.
Modular access, controls and utility penetrations adapt to the enclosed process equipment.
Kunden Produktbedenken
Localized wafer operations need stable cleanliness without enclosing an entire production bay to the same stringent conditions.
Typische Anwendungen
Technische Parameter
Typical construction values for a modular semiconductor mini-environment are listed below.
| Core Material | Anodized aluminum frame with clear polycarbonate panels and stainless steel work surfaces |
|---|---|
| Panel Dicke | 6-10 mm Transparente Gehäuse Panels |
| Effektive Breite | 1200-2400 mm process enclosure width |
| Maximale Länge | Up to 3000 mm modular enclosure length |
| Stahl facing Dicke | 1.0-1.5 mm stainless steel work and cabinet panels |
| Kerndichte | 2700 kg/m³ for aluminum framing and 7850-8000 kg/m³ for stainless components |
| Thermische Leitfähigkeit | 14-17 W/(m·K) for stainless work surfaces |
| Oberfläche Finish | Natural anodized aluminum, clear glazing and brushed stainless steel |
| Gemeinsamer Typ | Bolted modular extrusion joints with gasketed removable access panels |
| Customisierung | Verfügbar je nach beabsichtigter Anwendung und Betriebsumgebung. |
Verfügbare Optionen
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