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Equipamento de sala limpa específico da indústria

Sistema de limpeza FOUP

An enclosed wash-rinse-dry system that removes contamination from 300 mm FOUP and compatible carrier surfaces before controlled return to production.
  • Precision Jet Cleaning
  • High-Efficiency Drying
  • Enclosed Carrier Handling
  • Configurable Automation Interface
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Introdução do produto

The FOUP cleaning system integrates carrier loading, controlled opening, precision spray cleaning, rinse management and high-efficiency drying inside a stainless process enclosure. Dedicated chambers separate wet and dry stages to reduce carryover, while filtered air, drainable surfaces and accessible utility panels support repeatable contamination-control operation. Manual and automated handling arrangements can be configured around the fab material-flow strategy.

Características-chave

Directed liquid jets reach exterior surfaces, door structures and internal carrier features.

High-efficiency hot-air or air-knife drying reduces residual moisture and water traps.

Separated process zones limit cross-contamination between incoming and cleaned carriers.

Enclosed loading and configurable automation interfaces support controlled FOUP transfer.

Preocupações do produto do cliente

Reusable wafer carriers must be cleaned and completely dried without introducing new particles, trapped moisture or handling damage.

Complex FOUP geometry creates inaccessible particle and moisture traps.Multi-directional jet manifolds and staged rinsing reach internal recesses and door features.
Residual water can contaminate the next stored wafer lot.Controlled heated-air and air-knife drying targets hidden surfaces before release.
Manual opening and transfer can cross-contaminate clean and dirty carriers.Separated loading and process chambers define a controlled carrier path.
Cleaning equipment can become a bottleneck in a large FOUP fleet.Parallel chambers and automated recipes increase throughput while maintaining repeatable cycles.

Aplicações típicas

300 mm FOUP fleet cleaningFOSB carrier maintenanceSemiconductor contamination-control programsCarrier turnaround between wafer lots

Parâmetros técnicos

Typical construction values for an enclosed FOUP wash and dry system are listed below.

Material principal304 or 316L stainless steel process enclosure with engineering-polymer FOUP fixtures
Painel de espessura40-80 mm insulated service and process panels
Largura efetiva1800-2600 mm equipment width
Comprimento máximoUp to 3500 mm equipment depth
Aço enfrentando espessura1.2-2.0 mm stainless steel outer and process-chamber panels
Densidade Core7850-8000 kg/m³ for stainless process components
Condutividade térmica14-17 W/(m·K) for stainless process chambers
Superfície acabadoBrushed external stainless steel with smooth passivated wet-process surfaces
Tipo conjuntoGasketed process doors with welded drainable chambers and removable utility manifolds
CustomizaçãoDisponível com base na aplicação pretendida e no ambiente operacional.

Opções disponíveis

Manual or AMHS-compatible loadingParallel wash and dry chambersFOUP and FOSB fixturesRecipe and host-communication interface

Planning a FOUP Cleaning System specification?

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