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Cleanroom Wet Bench (em inglês)

A ventilated polypropylene wet-processing station integrating chemical baths, rinsing utilities and service access for controlled semiconductor and precision cleaning workflows.
  • Chemical-Resistant Construction
  • Controlled Rear Exhaust
  • Modular Process Baths
  • Serviceable Utility Cabinet
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Introdução do produto

The cleanroom wet bench provides an enclosed, exhausted work zone for wafer cleaning, etching and rinsing. Welded polypropylene surfaces resist common process chemicals, while rear baffles draw vapors away from the operator. Baths, cascade rinse modules, DI-water fittings, spray tools and controls can be arranged around the required process sequence, with lower access doors separating utilities from the working deck.

Características-chave

Welded polypropylene deck and enclosure resist corrosion and minimize exposed joints.

Rear and upper exhaust paths capture vapors across the process zone.

Modular bath openings accommodate heated process tanks, overflow rinses and sinks.

Accessible lower compartments simplify inspection of drains, valves and utility connections.

Preocupações do produto do cliente

Wet processes require chemical compatibility, reliable vapor capture and clean utility routing without compromising operator access.

Acid and alkali exposure rapidly degrades unsuitable bench materials.Chemical-compatible polypropylene or optional PVDF contact surfaces are selected for the process chemistry.
Fumes escape when exhaust distribution is uneven.Adjustable rear baffles and top exhaust connections draw air uniformly across the working zone.
Mixed rinse and process steps create inefficient handling paths.Baths, faucets and spray tools are arranged in the actual operating sequence.
Hidden leaks and blocked drains are difficult to service.Front-access utility compartments provide direct access to valves, unions and drain lines.

Aplicações típicas

Semiconductor wafer cleaning and etchingPhotovoltaic and substrate processingPrecision parts chemical cleaningResearch cleanroom wet chemistry

Parâmetros técnicos

Typical construction values for a modular polypropylene cleanroom wet bench are listed below.

Material principalWelded chemical-resistant polypropylene with optional PVDF process-contact components
Painel de espessura8-20 mm polypropylene panels
Largura efetiva1200-3000 mm work-zone width
Comprimento máximoUp to 6000 mm modular bench length
Aço enfrentando espessura1.0-1.5 mm for optional stainless utility reinforcement
Densidade Core900-920 kg/m³ for polypropylene construction sheet
Condutividade térmica0.20-0.24 W/(m·K) for polypropylene construction
Superfície acabadoSmooth natural-white welded polypropylene with transparent amber safety sash
Tipo conjuntoHot-gas welded enclosure seams with gasketed access panels, union utility fittings and flanged exhaust connections
CustomizaçãoDisponível com base na aplicação pretendida e no ambiente operacional.

Opções disponíveis

Open or enclosed sash configurationHEPA-supplied laminar airflow hoodQuartz, PP or PVDF process bathsPLC controls and automated chemical handling

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