Cleanroom wet bench complete three-quarter view with two process baths and amber sash

業界特有のクリーンルーム機器

クリーンルームウェットベンチ

A ventilated polypropylene wet-processing station integrating chemical baths, rinsing utilities and service access for controlled semiconductor and precision cleaning workflows.

Chemical-Resistant Construction
Controlled Rear Exhaust
Modular Process Baths
Serviceable Utility Cabinet

見積もりリクエスト製品案内

商品紹介

The cleanroom wet bench provides an enclosed, exhausted work zone for wafer cleaning, etching and rinsing. Welded polypropylene surfaces resist common process chemicals, while rear baffles draw vapors away from the operator. Baths, cascade rinse modules, DI-water fittings, spray tools and controls can be arranged around the required process sequence, with lower access doors separating utilities from the working deck.

主要な特徴

Welded polypropylene deck and enclosure resist corrosion and minimize exposed joints.

Rear and upper exhaust paths capture vapors across the process zone.

Modular bath openings accommodate heated process tanks, overflow rinses and sinks.

Accessible lower compartments simplify inspection of drains, valves and utility connections.

お客様の製品に関する懸念事項

Wet processes require chemical compatibility, reliable vapor capture and clean utility routing without compromising operator access.

Acid and alkali exposure rapidly degrades unsuitable bench materials.Chemical-compatible polypropylene or optional PVDF contact surfaces are selected for the process chemistry.

Fumes escape when exhaust distribution is uneven.Adjustable rear baffles and top exhaust connections draw air uniformly across the working zone.

Mixed rinse and process steps create inefficient handling paths.Baths, faucets and spray tools are arranged in the actual operating sequence.

Hidden leaks and blocked drains are difficult to service.Front-access utility compartments provide direct access to valves, unions and drain lines.

典型的な用途

Semiconductor wafer cleaning and etchingPhotovoltaic and substrate processingPrecision parts chemical cleaningResearch cleanroom wet chemistry

技術的なパラメータ

Typical construction values for a modular polypropylene cleanroom wet bench are listed below.

コア材料	Welded chemical-resistant polypropylene with optional PVDF process-contact components
パネルの厚さ	8-20 mm polypropylene panels
有効幅	1200-3000 mm work-zone width
最大長さ	Up to 6000 mm modular bench length
鋼鉄の厚さを直面する	1.0-1.5 mm for optional stainless utility reinforcement
コア密度	900-920 kg/m³ for polypropylene construction sheet
熱伝導率	0.20-0.24 W/(m·K) for polypropylene construction
表面仕上げ	Smooth natural-white welded polypropylene with transparent amber safety sash
ジョイントタイプ	Hot-gas welded enclosure seams with gasketed access panels, union utility fittings and flanged exhaust connections
カスタマイズ	意図したアプリケーションと動作環境に基づいて利用できます。

利用可能なオプション

Open or enclosed sash configurationHEPA-supplied laminar airflow hoodQuartz, PP or PVDF process bathsPLC controls and automated chemical handling

Planning a Cleanroom Wet Bench specification?

寸法、設置条件、性能目標、必要な表面仕上げをお送りください。

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