Cleanroom wet bench complete three-quarter view with two process baths and amber sash

Оборудование для чистых помещений

Мокрый скамейка в чистой комнате

A ventilated polypropylene wet-processing station integrating chemical baths, rinsing utilities and service access for controlled semiconductor and precision cleaning workflows.

Chemical-Resistant Construction
Controlled Rear Exhaust
Modular Process Baths
Serviceable Utility Cabinet

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Введение продукции

The cleanroom wet bench provides an enclosed, exhausted work zone for wafer cleaning, etching and rinsing. Welded polypropylene surfaces resist common process chemicals, while rear baffles draw vapors away from the operator. Baths, cascade rinse modules, DI-water fittings, spray tools and controls can be arranged around the required process sequence, with lower access doors separating utilities from the working deck.

Основные характеристики

Welded polypropylene deck and enclosure resist corrosion and minimize exposed joints.

Rear and upper exhaust paths capture vapors across the process zone.

Modular bath openings accommodate heated process tanks, overflow rinses and sinks.

Accessible lower compartments simplify inspection of drains, valves and utility connections.

Обеспокоенность клиентов продуктами

Wet processes require chemical compatibility, reliable vapor capture and clean utility routing without compromising operator access.

Acid and alkali exposure rapidly degrades unsuitable bench materials.Chemical-compatible polypropylene or optional PVDF contact surfaces are selected for the process chemistry.

Fumes escape when exhaust distribution is uneven.Adjustable rear baffles and top exhaust connections draw air uniformly across the working zone.

Mixed rinse and process steps create inefficient handling paths.Baths, faucets and spray tools are arranged in the actual operating sequence.

Hidden leaks and blocked drains are difficult to service.Front-access utility compartments provide direct access to valves, unions and drain lines.

Типичные приложения

Semiconductor wafer cleaning and etchingPhotovoltaic and substrate processingPrecision parts chemical cleaningResearch cleanroom wet chemistry

Технические параметры

Typical construction values for a modular polypropylene cleanroom wet bench are listed below.

Основной материал	Welded chemical-resistant polypropylene with optional PVDF process-contact components
Толщина панели	8-20 mm polypropylene panels
эффективная ширина	1200-3000 mm work-zone width
Максимальная длина	Up to 6000 mm modular bench length
Толщина линий стали	1.0-1.5 mm for optional stainless utility reinforcement
Плотность ядра	900-920 kg/m³ for polypropylene construction sheet
Теплопроводимость	0.20-0.24 W/(m·K) for polypropylene construction
Поверхностная отделка	Smooth natural-white welded polypropylene with transparent amber safety sash
Объединенный тип	Hot-gas welded enclosure seams with gasketed access panels, union utility fittings and flanged exhaust connections
Customization	Доступно в зависимости от предполагаемого применения и операционной среды.

Доступные варианты

Open or enclosed sash configurationHEPA-supplied laminar airflow hoodQuartz, PP or PVDF process bathsPLC controls and automated chemical handling

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