Englisch
DeutschCurrent
Arabisch
Französisch
indonesisch
Japanisch
Koreanisch
Malaiisch
Portugiesisch
Russisch
Spanisch
Thailändisch
Türkischer Sprache
Vietnamesisch
Branchenspezifische Reinraumausrüstung
Cleanroom Wet Bench
A ventilated polypropylene wet-processing station integrating chemical baths, rinsing utilities and service access for controlled semiconductor and precision cleaning workflows.
- Chemical-Resistant Construction
- Controlled Rear Exhaust
- Modular Process Baths
- Serviceable Utility Cabinet
Produkteinführung
The cleanroom wet bench provides an enclosed, exhausted work zone for wafer cleaning, etching and rinsing. Welded polypropylene surfaces resist common process chemicals, while rear baffles draw vapors away from the operator. Baths, cascade rinse modules, DI-water fittings, spray tools and controls can be arranged around the required process sequence, with lower access doors separating utilities from the working deck.
Key Features
Rear and upper exhaust paths capture vapors across the process zone.
Modular bath openings accommodate heated process tanks, overflow rinses and sinks.
Accessible lower compartments simplify inspection of drains, valves and utility connections.
Kunden Produktbedenken
Wet processes require chemical compatibility, reliable vapor capture and clean utility routing without compromising operator access.
Acid and alkali exposure rapidly degrades unsuitable bench materials.Chemical-compatible polypropylene or optional PVDF contact surfaces are selected for the process chemistry.
Fumes escape when exhaust distribution is uneven.Adjustable rear baffles and top exhaust connections draw air uniformly across the working zone.
Mixed rinse and process steps create inefficient handling paths.Baths, faucets and spray tools are arranged in the actual operating sequence.
Hidden leaks and blocked drains are difficult to service.Front-access utility compartments provide direct access to valves, unions and drain lines.
Typische Anwendungen
Semiconductor wafer cleaning and etchingPhotovoltaic and substrate processingPrecision parts chemical cleaningResearch cleanroom wet chemistry
Technische Parameter
Typical construction values for a modular polypropylene cleanroom wet bench are listed below.
| Core Material | Welded chemical-resistant polypropylene with optional PVDF process-contact components |
|---|---|
| Panel Dicke | 8-20 mm polypropylene panels |
| Effektive Breite | 1200-3000 mm work-zone width |
| Maximale Länge | Up to 6000 mm modular bench length |
| Stahl facing Dicke | 1.0-1.5 mm for optional stainless utility reinforcement |
| Kerndichte | 900-920 kg/m³ for polypropylene construction sheet |
| Thermische Leitfähigkeit | 0.20-0.24 W/(m·K) for polypropylene construction |
| Oberfläche Finish | Smooth natural-white welded polypropylene with transparent amber safety sash |
| Gemeinsamer Typ | Hot-gas welded enclosure seams with gasketed access panels, union utility fittings and flanged exhaust connections |
| Customisierung | Verfügbar je nach beabsichtigter Anwendung und Betriebsumgebung. |
Verfügbare Optionen
Open or enclosed sash configurationHEPA-supplied laminar airflow hoodQuartz, PP or PVDF process bathsPLC controls and automated chemical handling
Planning a Cleanroom Wet Bench specification?
Senden Sie uns Ihre Abmessungen, Installationsbedingungen, Leistungsziele und gewünschte Oberflächenveredelung.
