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Equipement de salle blanche spécifique à l'industrie

Banque propre Wet Bench

A ventilated polypropylene wet-processing station integrating chemical baths, rinsing utilities and service access for controlled semiconductor and precision cleaning workflows.
  • Chemical-Resistant Construction
  • Controlled Rear Exhaust
  • Modular Process Baths
  • Serviceable Utility Cabinet
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Introduction de produit

The cleanroom wet bench provides an enclosed, exhausted work zone for wafer cleaning, etching and rinsing. Welded polypropylene surfaces resist common process chemicals, while rear baffles draw vapors away from the operator. Baths, cascade rinse modules, DI-water fittings, spray tools and controls can be arranged around the required process sequence, with lower access doors separating utilities from the working deck.

Key Features

Welded polypropylene deck and enclosure resist corrosion and minimize exposed joints.

Rear and upper exhaust paths capture vapors across the process zone.

Modular bath openings accommodate heated process tanks, overflow rinses and sinks.

Accessible lower compartments simplify inspection of drains, valves and utility connections.

Préoccupations du client produit

Wet processes require chemical compatibility, reliable vapor capture and clean utility routing without compromising operator access.

Acid and alkali exposure rapidly degrades unsuitable bench materials.Chemical-compatible polypropylene or optional PVDF contact surfaces are selected for the process chemistry.
Fumes escape when exhaust distribution is uneven.Adjustable rear baffles and top exhaust connections draw air uniformly across the working zone.
Mixed rinse and process steps create inefficient handling paths.Baths, faucets and spray tools are arranged in the actual operating sequence.
Hidden leaks and blocked drains are difficult to service.Front-access utility compartments provide direct access to valves, unions and drain lines.

Les applications typiques

Semiconductor wafer cleaning and etchingPhotovoltaic and substrate processingPrecision parts chemical cleaningResearch cleanroom wet chemistry

Paramètres techniques

Typical construction values for a modular polypropylene cleanroom wet bench are listed below.

Matériaux de baseWelded chemical-resistant polypropylene with optional PVDF process-contact components
Panneau épaisseur8-20 mm polypropylene panels
Largeur effective1200-3000 mm work-zone width
Longueur maximaleUp to 6000 mm modular bench length
Acier face épaisseur1.0-1.5 mm for optional stainless utility reinforcement
Densité Core900-920 kg/m³ for polypropylene construction sheet
Conductivité thermique0.20-0.24 W/(m·K) for polypropylene construction
surface finieSmooth natural-white welded polypropylene with transparent amber safety sash
Type jointHot-gas welded enclosure seams with gasketed access panels, union utility fittings and flanged exhaust connections
CustomisationDisponible en fonction de l'application prévue et de l'environnement d'exploitation.

Options disponibles

Open or enclosed sash configurationHEPA-supplied laminar airflow hoodQuartz, PP or PVDF process bathsPLC controls and automated chemical handling

Planning a Cleanroom Wet Bench specification?

Envoyez-nous vos dimensions, conditions d'installation, objectifs de performance et finition de surface requise.

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