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Equipamento de sala limpa específico da indústria
Filtro Químico FFU
A ceiling or mini-environment fan-filter unit that combines gas-phase chemical media with final particulate filtration for localized AMC control.
- Gas-Phase Chemical Filtration
- Integrated EC Fan
- Final Particulate Filter
- Replaceable Media Cassettes
Introdução do produto
The chemical filter FFU draws return or room air through selected gas-phase media before delivering it through a final particulate filter and uniform diffuser. Activated carbon, impregnated media or blended chemisorbents can be selected around the target airborne molecular contaminant. A compact EC fan and modular media drawer support local installation above semiconductor mini-environments, sensitive process zones or ceiling-grid positions.
Características-chave
A final particulate filter captures media dust and airborne particles before supply air enters the protected zone.
EC fan control provides adjustable airflow for pressure balancing and filter loading compensation.
Service drawers allow chemical-media replacement without dismantling the complete unit housing.
Preocupações do produto do cliente
Sensitive semiconductor processes need control of molecular contaminants as well as particles, often within a limited ceiling or tool-envelope depth.
A conventional HEPA FFU does not remove gases or airborne molecular contaminants.Dedicated adsorbent and chemisorbent stages remove target molecular species before final filtration.
One universal carbon grade cannot efficiently address every contaminant family.Modular cassettes allow media chemistry to be selected for acids, bases, organics or dopants.
Media replacement can interrupt the protected process zone.Accessible service drawers shorten change time and keep the fan/filter housing installed.
Rising filter resistance reduces airflow over time.Adjustable EC fan control restores the required flow within the equipment operating range.
Aplicações típicas
Semiconductor mini-environmentsPhotolithography process areasChemical-sensitive metrology zonesLocalized AMC control above wafer handling
Parâmetros técnicos
Typical construction values for a compact chemical-filter fan-filter unit are shown below.
| Material principal | Galvanized or stainless steel housing with activated-carbon or impregnated chemisorbent media |
|---|---|
| Painel de espessura | 100-450 mm overall equipment depth |
| Largura efetiva | 575-1220 mm nominal module width |
| Comprimento máximo | Up to 1220 mm module length |
| Aço enfrentando espessura | 0.8-1.2 mm metal housing panels |
| Densidade Core | 350-650 kg/m³ for packed chemical media cassettes |
| Condutividade térmica | 14-17 W/(m·K) for stainless housing components |
| Superfície acabado | Brushed stainless steel or cleanroom-grade powder-coated metal housing |
| Tipo conjunto | Gasketed filter seats with latched chemical-media drawer and bolted fan housing |
| Customização | Disponível com base na aplicação pretendida e no ambiente operacional. |
Opções disponíveis
Acid, base, organic or dopant mediaHEPA or ULPA final filterLocal, analog or network fan controlCeiling-grid or mini-environment mounting
Planning a Chemical Filter FFU specification?
Envie-nos as suas dimensões, condições de instalação, metas de desempenho e acabamento de superfície necessário.
