Inglés
Alemán
El árabe
Francés
Idioma indonesio
El japonés
Coreano
El malayo
El portugués
El ruso
EspañolCurrent
Tailandés
El turco
El vietnamita
Equipos de sala limpia específicos de la industria
Filtro químico FFU
A ceiling or mini-environment fan-filter unit that combines gas-phase chemical media with final particulate filtration for localized AMC control.
- Gas-Phase Chemical Filtration
- Integrated EC Fan
- Final Particulate Filter
- Replaceable Media Cassettes
Introducción del producto
The chemical filter FFU draws return or room air through selected gas-phase media before delivering it through a final particulate filter and uniform diffuser. Activated carbon, impregnated media or blended chemisorbents can be selected around the target airborne molecular contaminant. A compact EC fan and modular media drawer support local installation above semiconductor mini-environments, sensitive process zones or ceiling-grid positions.
Características clave
A final particulate filter captures media dust and airborne particles before supply air enters the protected zone.
EC fan control provides adjustable airflow for pressure balancing and filter loading compensation.
Service drawers allow chemical-media replacement without dismantling the complete unit housing.
Preocupaciones del producto del cliente
Sensitive semiconductor processes need control of molecular contaminants as well as particles, often within a limited ceiling or tool-envelope depth.
A conventional HEPA FFU does not remove gases or airborne molecular contaminants.Dedicated adsorbent and chemisorbent stages remove target molecular species before final filtration.
One universal carbon grade cannot efficiently address every contaminant family.Modular cassettes allow media chemistry to be selected for acids, bases, organics or dopants.
Media replacement can interrupt the protected process zone.Accessible service drawers shorten change time and keep the fan/filter housing installed.
Rising filter resistance reduces airflow over time.Adjustable EC fan control restores the required flow within the equipment operating range.
Aplicaciones típicas
Semiconductor mini-environmentsPhotolithography process areasChemical-sensitive metrology zonesLocalized AMC control above wafer handling
Parámetros técnicos
Typical construction values for a compact chemical-filter fan-filter unit are shown below.
| Materiales Core | Galvanized or stainless steel housing with activated-carbon or impregnated chemisorbent media |
|---|---|
| Panel de espesor | 100-450 mm overall equipment depth |
| Ancho efectivo | 575-1220 mm nominal module width |
| Longitud máxima | Up to 1220 mm module length |
| Acero frente a espesor | 0.8-1.2 mm metal housing panels |
| Densidad Core | 350-650 kg/m³ for packed chemical media cassettes |
| Conductividad térmica | 14-17 W/(m·K) for stainless housing components |
| Superficie acabada | Brushed stainless steel or cleanroom-grade powder-coated metal housing |
| Tipo conjunto | Gasketed filter seats with latched chemical-media drawer and bolted fan housing |
| Customization | Disponible según la aplicación prevista y el entorno operativo. |
Opciones disponibles
Acid, base, organic or dopant mediaHEPA or ULPA final filterLocal, analog or network fan controlCeiling-grid or mini-environment mounting
Planning a Chemical Filter FFU specification?
Envíenos sus dimensiones, condiciones de instalación, objetivos de rendimiento y acabado superficial requerido.
