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業界特有のクリーンルーム機器

化学フィルター FFU

A ceiling or mini-environment fan-filter unit that combines gas-phase chemical media with final particulate filtration for localized AMC control.
  • Gas-Phase Chemical Filtration
  • Integrated EC Fan
  • Final Particulate Filter
  • Replaceable Media Cassettes
見積もりリクエスト 製品案内

商品紹介

The chemical filter FFU draws return or room air through selected gas-phase media before delivering it through a final particulate filter and uniform diffuser. Activated carbon, impregnated media or blended chemisorbents can be selected around the target airborne molecular contaminant. A compact EC fan and modular media drawer support local installation above semiconductor mini-environments, sensitive process zones or ceiling-grid positions.

主要な特徴

Replaceable chemical-media cassettes target selected acid, base, organic or dopant contaminants.

A final particulate filter captures media dust and airborne particles before supply air enters the protected zone.

EC fan control provides adjustable airflow for pressure balancing and filter loading compensation.

Service drawers allow chemical-media replacement without dismantling the complete unit housing.

お客様の製品に関する懸念事項

Sensitive semiconductor processes need control of molecular contaminants as well as particles, often within a limited ceiling or tool-envelope depth.

A conventional HEPA FFU does not remove gases or airborne molecular contaminants.Dedicated adsorbent and chemisorbent stages remove target molecular species before final filtration.
One universal carbon grade cannot efficiently address every contaminant family.Modular cassettes allow media chemistry to be selected for acids, bases, organics or dopants.
Media replacement can interrupt the protected process zone.Accessible service drawers shorten change time and keep the fan/filter housing installed.
Rising filter resistance reduces airflow over time.Adjustable EC fan control restores the required flow within the equipment operating range.

典型的な用途

Semiconductor mini-environmentsPhotolithography process areasChemical-sensitive metrology zonesLocalized AMC control above wafer handling

技術的なパラメータ

Typical construction values for a compact chemical-filter fan-filter unit are shown below.

コア材料Galvanized or stainless steel housing with activated-carbon or impregnated chemisorbent media
パネルの厚さ100-450 mm overall equipment depth
有効幅575-1220 mm nominal module width
最大長さUp to 1220 mm module length
鋼鉄の厚さを直面する0.8-1.2 mm metal housing panels
コア密度350-650 kg/m³ for packed chemical media cassettes
熱伝導率14-17 W/(m·K) for stainless housing components
表面仕上げBrushed stainless steel or cleanroom-grade powder-coated metal housing
ジョイントタイプGasketed filter seats with latched chemical-media drawer and bolted fan housing
カスタマイズ意図したアプリケーションと動作環境に基づいて利用できます。

利用可能なオプション

Acid, base, organic or dopant mediaHEPA or ULPA final filterLocal, analog or network fan controlCeiling-grid or mini-environment mounting

Planning a Chemical Filter FFU specification?

寸法、設置条件、性能目標、必要な表面仕上げをお送りください。

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