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Sistemas de Utilidade de Cleanroom
Redução de TOC UV
A monitored 185 nm ultraviolet oxidation unit that converts trace organic contaminants into more readily removable ionic and gaseous species.
- 185 nm organic oxidation
- Dual hygienic UV reactors
- Monitored high-purity operation
Introdução do produto
The TOC reduction UV unit exposes high-purity water to short-wave ultraviolet energy that forms reactive hydroxyl species. These oxidize trace organic molecules into smaller compounds, carbon dioxide and ionic fragments that downstream polishing equipment can remove more effectively. Twin reactors provide practical lamp power and service flexibility in a compact skid.
Características-chave
Twin 316L reactor arrangement
High-purity quartz sleeves
UV intensity and lamp-hour monitoring
Sanitary stainless manifolds
Separate protected controller
Configurable series or parallel flow
Integration with ion exchange or degassing
Preocupações do produto do cliente
TOC oxidation performance depends on UV transmittance, lamp output, residence time and the ability of downstream treatment to remove oxidation products.
Trace organics pass conventional deionizationApply 185 nm UV upstream of polishing resin to convert weakly ionized organics into removable products.
Lamp output drifts unnoticedTrack UV intensity and operating hours independently for each reactor.
Oxidation products accumulate in the loopCoordinate the UV duty with downstream ion exchange and membrane-degassing capacity.
Quartz fouling reduces photon transferMaintain feed-water quality and schedule sleeve inspection and cleaning.
Aplicações típicas
Pharmaceutical purified-water polishingUltrapure laboratory waterSemiconductor rinse-water productionBiotechnology process-water loopsFeed polishing before high-purity points of use
Parâmetros técnicos
Lamp count, reactor configuration and power are selected from flow, inlet TOC, UV transmittance and downstream polishing capacity.
| Material principal | 316L stainless steel reactors with high-purity fused-quartz lamp sleeves |
|---|---|
| Painel de espessura | Reactor wall typically 2.0–5.0 mm |
| Largura efetiva | Skid width typically 600–1400 mm |
| Comprimento máximo | Complete skid height or length typically up to 2400 mm |
| Aço enfrentando espessura | Control enclosure and skid sheet components typically 1.5–3.0 mm |
| Densidade Core | 316L stainless steel density approximately 8000 kg/m³ |
| Condutividade térmica | 316L stainless steel approximately 15 W/(m·K) at ambient temperature |
| Superfície acabado | Electropolished or mechanically polished wetted reactors with satin-finished skid and enclosure |
| Tipo conjunto | Orbital-welded or sanitary-clamp manifolds with sealed quartz sleeves and instrument ports |
| Customização | Disponível com base na aplicação pretendida e no ambiente operacional. |
Opções disponíveis
Single or twin reactorsSeries or parallel pipingUV intensity sensorFlow interlockTOC analyzer interfaceRemote communicationStainless control enclosure
Planning a TOC Reduction UV Unit specification?
Envie-nos as suas dimensões, condições de instalação, metas de desempenho e acabamento de superfície necessário.
