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Laman Utama / Produk / Sistem Utiliti Bilik Bersih / TOC Reduction UV Unit
Sistem Utiliti Bilik Bersih

Unit UV Pengurangan TOC

A monitored 185 nm ultraviolet oxidation unit that converts trace organic contaminants into more readily removable ionic and gaseous species.
  • 185 nm organic oxidation
  • Dual hygienic UV reactors
  • Monitored high-purity operation
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Pengenalan Produk

The TOC reduction UV unit exposes high-purity water to short-wave ultraviolet energy that forms reactive hydroxyl species. These oxidize trace organic molecules into smaller compounds, carbon dioxide and ionic fragments that downstream polishing equipment can remove more effectively. Twin reactors provide practical lamp power and service flexibility in a compact skid.

Ciri-ciri Utama

185 nm UV lamp technology

Twin 316L reactor arrangement

High-purity quartz sleeves

UV intensity and lamp-hour monitoring

Sanitary stainless manifolds

Separate protected controller

Configurable series or parallel flow

Integration with ion exchange or degassing

Kebimbangan Produk Pelanggan

TOC oxidation performance depends on UV transmittance, lamp output, residence time and the ability of downstream treatment to remove oxidation products.

Trace organics pass conventional deionizationApply 185 nm UV upstream of polishing resin to convert weakly ionized organics into removable products.
Lamp output drifts unnoticedTrack UV intensity and operating hours independently for each reactor.
Oxidation products accumulate in the loopCoordinate the UV duty with downstream ion exchange and membrane-degassing capacity.
Quartz fouling reduces photon transferMaintain feed-water quality and schedule sleeve inspection and cleaning.

Permohonan yang biasa

Pharmaceutical purified-water polishingUltrapure laboratory waterSemiconductor rinse-water productionBiotechnology process-water loopsFeed polishing before high-purity points of use

Parameter teknikal

Lamp count, reactor configuration and power are selected from flow, inlet TOC, UV transmittance and downstream polishing capacity.

Bahan Teras316L stainless steel reactors with high-purity fused-quartz lamp sleeves
Ketebalan PanelReactor wall typically 2.0–5.0 mm
Lebar berkesanSkid width typically 600–1400 mm
Panjang maksimumComplete skid height or length typically up to 2400 mm
Keluli Menghadapi KetebalanControl enclosure and skid sheet components typically 1.5–3.0 mm
Ketumpatan teras316L stainless steel density approximately 8000 kg/m³
Kekonduksian Terma316L stainless steel approximately 15 W/(m·K) at ambient temperature
Kemasan permukaanElectropolished or mechanically polished wetted reactors with satin-finished skid and enclosure
Jenis BersatuOrbital-welded or sanitary-clamp manifolds with sealed quartz sleeves and instrument ports
PenyesuaianBoleh didapati berdasarkan aplikasi yang dimaksudkan dan persekitaran operasi.

Pilihan yang boleh didapati

Single or twin reactorsSeries or parallel pipingUV intensity sensorFlow interlockTOC analyzer interfaceRemote communicationStainless control enclosure

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