상품 소개
The TOC reduction UV unit exposes high-purity water to short-wave ultraviolet energy that forms reactive hydroxyl species. These oxidize trace organic molecules into smaller compounds, carbon dioxide and ionic fragments that downstream polishing equipment can remove more effectively. Twin reactors provide practical lamp power and service flexibility in a compact skid.
주요 기능
Twin 316L reactor arrangement
High-purity quartz sleeves
UV intensity and lamp-hour monitoring
Sanitary stainless manifolds
Separate protected controller
Configurable series or parallel flow
Integration with ion exchange or degassing
고객 제품 관심사
TOC oxidation performance depends on UV transmittance, lamp output, residence time and the ability of downstream treatment to remove oxidation products.
Trace organics pass conventional deionizationApply 185 nm UV upstream of polishing resin to convert weakly ionized organics into removable products.
Lamp output drifts unnoticedTrack UV intensity and operating hours independently for each reactor.
Oxidation products accumulate in the loopCoordinate the UV duty with downstream ion exchange and membrane-degassing capacity.
Quartz fouling reduces photon transferMaintain feed-water quality and schedule sleeve inspection and cleaning.
일반적인 응용 프로그램
Pharmaceutical purified-water polishingUltrapure laboratory waterSemiconductor rinse-water productionBiotechnology process-water loopsFeed polishing before high-purity points of use
기술 매개변수
Lamp count, reactor configuration and power are selected from flow, inlet TOC, UV transmittance and downstream polishing capacity.
| 핵심 재료 | 316L stainless steel reactors with high-purity fused-quartz lamp sleeves |
|---|---|
| 패널 두께 | Reactor wall typically 2.0–5.0 mm |
| 유효 폭 | Skid width typically 600–1400 mm |
| 최대 길이 | Complete skid height or length typically up to 2400 mm |
| 강철 면면 두께 | Control enclosure and skid sheet components typically 1.5–3.0 mm |
| 코어 밀도 | 316L stainless steel density approximately 8000 kg/m³ |
| 열전도도 (Thermal Conductivity) | 316L stainless steel approximately 15 W/(m·K) at ambient temperature |
| 표면 마무리 | Electropolished or mechanically polished wetted reactors with satin-finished skid and enclosure |
| 접합 유형 | Orbital-welded or sanitary-clamp manifolds with sealed quartz sleeves and instrument ports |
| 사용자 정의 | 의도된 응용 프로그램 및 운영 환경에 따라 사용할 수 있습니다. |
사용 가능한 옵션
Single or twin reactorsSeries or parallel pipingUV intensity sensorFlow interlockTOC analyzer interfaceRemote communicationStainless control enclosure
Planning a TOC Reduction UV Unit specification?
치수, 설치 조건, 성능 목표 및 필요한 표면 마감을 보내십시오.

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