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أنظمة المرافق الغرف النظيفة

TOC تخفيض وحدة الأشعة فوق البنفسجية

A monitored 185 nm ultraviolet oxidation unit that converts trace organic contaminants into more readily removable ionic and gaseous species.
  • 185 nm organic oxidation
  • Dual hygienic UV reactors
  • Monitored high-purity operation
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مقدمة المنتج

The TOC reduction UV unit exposes high-purity water to short-wave ultraviolet energy that forms reactive hydroxyl species. These oxidize trace organic molecules into smaller compounds, carbon dioxide and ionic fragments that downstream polishing equipment can remove more effectively. Twin reactors provide practical lamp power and service flexibility in a compact skid.

الخصائص الرئيسية

185 nm UV lamp technology

Twin 316L reactor arrangement

High-purity quartz sleeves

UV intensity and lamp-hour monitoring

Sanitary stainless manifolds

Separate protected controller

Configurable series or parallel flow

Integration with ion exchange or degassing

مخاوف المنتج للعملاء

TOC oxidation performance depends on UV transmittance, lamp output, residence time and the ability of downstream treatment to remove oxidation products.

Trace organics pass conventional deionizationApply 185 nm UV upstream of polishing resin to convert weakly ionized organics into removable products.
Lamp output drifts unnoticedTrack UV intensity and operating hours independently for each reactor.
Oxidation products accumulate in the loopCoordinate the UV duty with downstream ion exchange and membrane-degassing capacity.
Quartz fouling reduces photon transferMaintain feed-water quality and schedule sleeve inspection and cleaning.

تطبيقات نموذجية

Pharmaceutical purified-water polishingUltrapure laboratory waterSemiconductor rinse-water productionBiotechnology process-water loopsFeed polishing before high-purity points of use

المعلمات الفنية

Lamp count, reactor configuration and power are selected from flow, inlet TOC, UV transmittance and downstream polishing capacity.

المواد الأساسية316L stainless steel reactors with high-purity fused-quartz lamp sleeves
سمك اللوحةReactor wall typically 2.0–5.0 mm
العرض الفعالSkid width typically 600–1400 mm
الحد الأقصى الطولComplete skid height or length typically up to 2400 mm
الصلب يواجه سمكControl enclosure and skid sheet components typically 1.5–3.0 mm
الكثافة الأساسية316L stainless steel density approximately 8000 kg/m³
الموصلية الحرارية316L stainless steel approximately 15 W/(m·K) at ambient temperature
إنهاء السطحElectropolished or mechanically polished wetted reactors with satin-finished skid and enclosure
نوع المشتركOrbital-welded or sanitary-clamp manifolds with sealed quartz sleeves and instrument ports
التخصيصمتوفر على أساس التطبيق المقصود وبيئة التشغيل.

الخيارات المتاحة

Single or twin reactorsSeries or parallel pipingUV intensity sensorFlow interlockTOC analyzer interfaceRemote communicationStainless control enclosure

Planning a TOC Reduction UV Unit specification?

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