Three-quarter view of an AMC chemical filter FFU with dark carbon cassette and white plenum

FFU 및 터미널 공기 정화 장비

AMC 화학 필터 FFU

A two-stage fan filter unit that combines target-specific molecular adsorbent media with downstream HEPA or ULPA filtration for contamination-sensitive processes.

Targeted AMC Adsorbents
Two-Stage Filtration
낮은 가스 배출 건설
Replaceable Media Cassettes

견적 요청 제품 찾아보기

상품 소개

The AMC chemical filter FFU is built around a removable molecular panel installed upstream of a particulate final filter. Activated carbon captures volatile organic compounds, impregnated carbon targets acidic species and ion-exchange media can be selected for alkaline contaminants such as ammonia. The downstream HEPA or ULPA stage retains particles released by the incoming air stream and protects the clean zone after the adsorption section. A deeper EC fan plenum provides the additional pressure needed for both stages without forcing a separate chemical-filter bank into the ceiling return path.

주요 기능

Adsorbent selection can be matched to acids, bases, VOCs, dopants or a defined multi-contaminant blend.

The molecular panel sits upstream of the particulate filter so captured gases do not bypass the final clean-air face.

Low-outgassing frame, gasket and sealant materials reduce secondary contamination inside sensitive clean zones.

Separate cassette access permits the chemical stage to be changed according to its own service life.

고객 제품 관심사

Particle counts alone do not reveal molecular contaminants that can corrode conductors, change photoresist chemistry or deposit films on precision surfaces.

Trace ammonia or acidic gases can shift sensitive process chemistry even when the cleanroom particle count is acceptable.A selected base- or acid-targeted adsorbent layer removes the relevant molecular species before supply air reaches the process.

One general-purpose carbon bed performs poorly when the contaminant mixture contains dissimilar compounds.Multiple embedded media types can be arranged in the same cassette for defined acids, bases and organic vapours.

Chemical media can shed particles or emit compounds that burden a downstream process zone.Cleanroom-grade low-shedding media is followed by a HEPA or ULPA panel that captures particulate carryover.

Replacing both filter stages together wastes usable particulate-filter life.Independent molecular and final-filter access allows each stage to follow its own pressure-drop or exposure schedule.

일반적인 응용 프로그램

Photolithography and coating areasSemiconductor metrology roomsReticle and wafer storageFlat-panel display processingBattery material dry rooms

기술 매개변수

Typical material and dimensional ranges for an AMC chemical filter FFU are shown below.

핵심 재료	Activated carbon, impregnated carbon or ion-exchange adsorbent panel upstream of a micro-glass HEPA or ULPA pack
패널 두께	400-620 mm overall module depth, depending on molecular media depth
유효 폭	575-1175 mm nominal ceiling-grid width
최대 길이	Up to 1220 mm standard module length
강철 면면 두께	1.0-1.5 mm powder-coated or stainless-steel plenum sheet
코어 밀도	Approximately 350-550 kg/m³ bulk density for selected granular or embedded adsorbent media
열전도도 (Thermal Conductivity)	Approximately 0.08-0.20 W/(m·K) for the selected dry carbon-based adsorption layer
표면 마무리	Low-outgassing white powder coat or brushed 304 stainless steel
접합 유형	Gasketed removable AMC cassette with downstream gel-seal or compression-seal particulate filter
사용자 정의	의도된 응용 프로그램 및 운영 환경에 따라 사용할 수 있습니다.

사용 가능한 옵션

Acid, base, VOC or combined adsorbent blendHEPA H14 or ULPA U15-U16 final stageGas sampling portsDifferential-pressure monitoring for both stages

Planning a AMC Chemical Filter FFU specification?

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