Three-quarter view of shallow AMC chemical filter for semiconductor cleanrooms

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AMC フィルター

A low-outgassing pleated molecular panel formulated to control airborne acids, bases, VOCs or selected dopants in semiconductor cleanrooms and process equipment.

Semiconductor AMC Control
Low-Outgassing Components
Targeted Pleated Adsorbents
FFU-Compatible Panel

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商品紹介

The AMC filter for semiconductor cleanrooms embeds activated carbon, ion-exchange resin or chemically modified adsorbent within a clean pleated support. The resulting panel provides substantially more active area than a flat granular screen while keeping the shallow depth required by fan filter units, return-air modules and process tools. Different media layers can target volatile organics, acids, bases or selected dopant compounds. Low-outgassing frame, separator, gasket and potting materials help the finished filter operate near contamination-sensitive wafer, display and storage processes.

主要な特徴

Pleated embedded adsorbent provides a high active area within the shallow envelope of a cleanroom terminal panel.

Media chemistry can be selected for VOC, acid, base or dopant contamination rather than using one universal carbon grade.

Low-outgassing support and frame materials reduce the filter assembly's own contribution to the clean environment.

Clean retaining layers limit adsorbent particle shedding toward downstream HEPA or ULPA media.

お客様の製品に関する懸念事項

Molecular contamination can alter wafer surfaces or corrode process hardware even when the cleanroom already meets its particulate classification.

Particle filters do not remove airborne acids, bases or volatile organic molecules.Embedded molecular adsorbents capture or react with the selected gas family before it reaches the process.

One broad-spectrum carbon grade cannot address multiple semiconductor AMC groups equally.Separate acid, base, VOC and dopant media layers can be arranged for the identified contaminant profile.

Loose chemical pellets shed dust toward a downstream ULPA terminal.Pleated embedded media and clean support scrims contain the adsorbent within the panel structure.

A deep chemical bed will not fit an FFU or process-tool return module.The high-area pleated panel provides a compact AMC stage in standard shallow cleanroom dimensions.

典型的な用途

Semiconductor wafer cleanroomsLithography and coating process toolsFlat-panel and OLED manufacturingChemical-sensitive storage cabinetsFFU and recirculation-air AMC stages

技術的なパラメータ

Typical construction ranges for a low-outgassing semiconductor AMC panel are listed below.

コア材料	Pleated activated-carbon, ion-exchange or chemically impregnated adsorbent embedded in a low-outgassing support
パネルの厚さ	25–100 mm overall cleanroom-panel depth
有効幅	305 — 610 mm 公称面幅
最大長さ	Up to 1220 mm nominal face length
鋼鉄の厚さを直面する	0.4–0.6 mm low-shedding stainless or coated retaining grid when specified
コア密度	Approximately 60–180 kg/m³ equivalent embedded-adsorbent media density
熱伝導率	Approximately 0.040–0.090 W/(m·K) for the dry pleated adsorbent composite
表面仕上げ	Natural anodized aluminium or clean low-outgassing polymer frame
ジョイントタイプ	Flat gasket, gel-compatible perimeter or clip-in FFU cassette connection
カスタマイズ	意図したアプリケーションと動作環境に基づいて利用できます。

利用可能なオプション

VOC-targeted activated carbonAcid-gas chemisorption mediaAmmonia and amine ion-exchange mediaSingle-layer or multi-layer AMC cassette

Planning a AMC Filter for Semiconductor Cleanrooms specification?

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