Selectable treatment paths
RO with EDI or mixed-bed stages can be arranged for the water quality needed by the electronic task.
PRODUCT GALLERYST
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Cleanroom Pure Water Systems
Semiconductor Ultrapure Water System – ST-LPW42 Series
Product specifications
| Brand | ST |
|---|---|
| Public model series | ST-LPW42 |
| Primary process | 0.2 or 0.5 µm final filtration |
| Final water quality | 15–18 MΩ·cm by selected process |
| Pretreatment | Media filtration, activated carbon, softening and precision filtration |
| Control | Automatic control with tank-level and pump-pressure protection |
| Online monitoring | Product-water quality |
Customization availableSpecifications can be customized to your requirements.
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Specify the quantity and configuration in your inquiry.
Semiconductor Ultrapure Water System – ST-LPW42 Series supplies treated water for electronic work where final filtration and the selected ionic-water quality matter to the process. It gives a defined treatment route for rinse and preparation points rather than treating every electronics task as the same purity requirement.
The 0.2 and 0.5 µm final-filter options change particle retention at the end of the process. They do not set dissolved-ion purity; the upstream treatment must establish that separately.
FEATURES AND BENEFITS
How it helps
Particle control at the outlet
Final filtration provides a separate particle barrier after the selected ionic-water treatment.
Monitored water collection
Tank-level and pump-pressure controls coordinate delivery while the online instrument shows changes in product-water quality.
APPLICATION ENVIRONMENTS
Where this configuration is used
Semiconductor Ultrapure Water production
Supplies controlled water for wafer, device and electronic-component rinsing.
Electronic materials
Supports compatible material, component and tooling rinses where dissolved ions can affect yield.
Precision cleaning
Provides the selected grade for final rinsing where residues, particles or ionic background must be limited.
SELECTION GUIDANCE
Choosing the configuration
Rinse and preparation outlets
Choose the ionic-water level for each rinse or solution-preparation task, then choose the final-filter pore size for its particle requirement. Set the storage reserve around collections that occur at the same time.
PROCUREMENT / INQUIRY
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