Low-residue final rinse
High-resistivity water reduces calcium, magnesium and salt marks on polished and coated surfaces.
Cleanroom Pure Water Systems
| Brand | ST |
|---|---|
| Public model series | ST-LPW53 |
| Final-water resistivity | ≥18 MΩ·cm |
| Final filtration | 0.2 or 0.5 µm |
| Process | Double-pass RO + EDI + mixed-bed polishing |
| Control | Automatic PLC control |
| Protection | Low-water, high-pressure and over-pressure protection |
Customization availableSpecifications can be customized to your requirements.
Specify the quantity and configuration in your inquiry.
Optical Lens Cleaning Ultrapure Water System – ST-LPW53 Series supplies high-resistivity final-rinse water for lenses and compatible optical components. Reducing dissolved salts helps limit drying residue on a cleaned surface before inspection, coating or assembly.
The final filter addresses particles while RO, EDI and mixed-bed polishing address dissolved ions. Both matter at the last rinse: a low-ion water reading alone cannot show whether particles have entered downstream of the treatment plant.
PROCESS AND CONTROL
High-resistivity water reduces calcium, magnesium and salt marks on polished and coated surfaces.
Continuous deionization followed by polishing controls trace ions before the final filter.
Controlled pumping maintains repeatable rinsing at cleaning stations.
APPLICATION ENVIRONMENTS
Supplies treated water for lens, frame, coated-glass and optical-component final rinsing.
Provides the selected water grade for compatible equipment, component and contact-surface rinsing.
Capacity, storage, materials and final treatment can be matched to the site's feed water and operating schedule.
SELECTION GUIDANCE
Choose the final-filter pore size for the optical cleaning process and arrange delivery to limit particle pickup before the last rinse. Size the supply for complete cleaning batches so collection does not interrupt rinsing before drying.
PROCUREMENT / INQUIRY
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