Pretreatment for rinse-water production
Filtration and softening reduce solids and hardness before water reaches the RO membranes.
PRODUCT GALLERYST
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Cleanroom Pure Water Systems
Monocrystalline Silicon Ultrapure Water System – ST-LPW45 Series
Product specifications
| Brand | ST |
|---|---|
| Public model series | ST-LPW45 |
| Primary process | double-pass RO + EDI + polishing mixed bed |
| Final water quality | 18.2 MΩ·cm at the point of use |
| Pretreatment | Media filtration, activated carbon, softening and precision filtration |
| Control | Automatic control with tank-level and pump-pressure protection |
| Online monitoring | Product-water quality |
Customization availableSpecifications can be customized to your requirements.
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Specify the quantity and configuration in your inquiry.
Monocrystalline Silicon Ultrapure Water System – ST-LPW45 Series provides polished process water for silicon-material and wafer washing. The treatment helps reduce salts carried into a rinse, where drying otherwise leaves residues on a surface that has already been cleaned.
Double-pass RO reduces the incoming dissolved load before EDI and mixed-bed polishing address the remaining ions. Production and rinse demand are sized together so the final wash has the appropriate water supply during a batch.
FEATURES AND BENEFITS
How it helps
Polishing after EDI
The mixed bed provides final ion removal for water delivered to silicon-material washing.
Process-dependent UV option
A downstream UV unit can be included when the washing process calls for microbial treatment as well as ionic purification.
APPLICATION ENVIRONMENTS
Where this configuration is used
Monocrystalline Silicon Ultrapure Water production
Supplies controlled water for silicon crystal and wafer washing.
Electronic materials
Supports compatible material, component and tooling rinses where dissolved ions can affect yield.
Precision cleaning
Provides the selected grade for final rinsing where residues, particles or ionic background must be limited.
SELECTION GUIDANCE
Choosing the configuration
Complete the final-rinse cycle
Plan storage and delivery for the volume drawn during a complete wafer-rinse cycle. Where the washing process also requires microbial control, include the appropriate downstream UV option in the selected configuration.
PROCUREMENT / INQUIRY
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