Application-matched polishing
RO, EDI and mixed-bed stages are combined around the ionic background allowed by the chemical process.
PRODUCT GALLERYST
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Cleanroom Pure Water Systems
Chemical Industry Ultrapure Water System – ST-LPW52 Series
Product specifications
| Brand | ST |
|---|---|
| Public model series | ST-LPW52 |
| Ultrapure-water resistivity | >18 MΩ·cm by polishing configuration |
| General process-water range | 0.1–20 µS/cm where lower purity is sufficient |
| EDI product water | >15 MΩ·cm |
| Operation | Continuous automatic production |
Customization availableSpecifications can be customized to your requirements.
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Specify the quantity and configuration in your inquiry.
Chemical Industry Ultrapure Water System – ST-LPW52 Series supplies water selected for chemical preparation, separation and precision washing. The treatment aims to avoid introducing unwanted ionic background into a formulation or analytical process through its water input.
Routine process-water conductivity and ultrapure polishing serve different duties. The RO, EDI and mixed-bed arrangement is chosen around that distinction, and continuous production supports repeated use where a manually replenished water source would interrupt the process.
PROCESS AND CONTROL
How this system solves the water-supply task
Continuous deionization
EDI produces high-resistivity water without routine acid or caustic regeneration.
Automatic operation
Continuous production and online monitoring reduce manual intervention in utility-water supply.
APPLICATION ENVIRONMENTS
Where this configuration is used
Primary process
Supplies treated water for chemical solvents, analytical preparation, materials washing, separation and product purification.
Production cleaning
Provides the selected water grade for compatible equipment, component and contact-surface rinsing.
Custom utility projects
Capacity, storage, materials and final treatment can be matched to the site's feed water and operating schedule.
SELECTION GUIDANCE
Choosing the configuration
Water as a process input
Select general process-water conductivity for duties that tolerate that ionic background and final polishing for sensitive formulations or separations. Size continuous supply around the actual sequence of chemical preparation and washing.
PROCUREMENT / INQUIRY
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