ST-LPW33-RO
The RO configuration supplies the listed ≤1–5 µS/cm water for tasks needing reverse-osmosis water or a feed for further point-of-use treatment.
Cleanroom Pure Water Systems
| Brand | ST |
|---|---|
| Public model series | ST-LPW33 |
| Feed water | Municipal water; TDS <200 ppm; 2.0–4.0 kg/cm²; 5–45°C |
| Production rate | 200/250/300/500/600/800/1000/1500/2000 L/h |
| Power supply | 380 VAC (±10%), 50 Hz |
| System desalination | ≥99.9% |
| Product-water pH | 6.5–7.5 |
| RO-water conductivity | ≤1–5 µS/cm at 25°C, online monitoring |
| Enhanced configuration microbial level | ≤1 CFU/mL |
| Enhanced configuration particle level | ≤1 particle/mL |
| Enhanced configuration heavy-metal ions | ≤0.1 ppb |
| Enhanced configuration TOC | ≤20 ppb |
| Enhanced configuration absorbance | ≤0.001 at 254 nm, 1 cm path |
| Enhanced configuration soluble silica | ≤0.01 mg/L |
Customization availableSpecifications can be customized to your requirements.
Specify the quantity and configuration in your inquiry.
Central Pure Water System – ST-LPW33 Series integrates automatic pretreatment, reverse osmosis, storage and circulating distribution. It provides one controlled source for laboratories that need different grades of centrally supplied water.
Three polishing levels cover routine RO water, analytical-grade water and enhanced low-TOC water. Production is available from 200 to 2,000 L/h.
MODELS AND DIMENSIONS
| Model | Configuration |
|---|---|
| ST-LPW33-RO | RO water, ≤1–5 µS/cm at 25°C |
| ST-LPW33-LI | RO plus analytical polishing |
| ST-LPW33-EL | Enhanced polishing; TOC ≤20 ppb |
MODEL DIFFERENCES
The RO configuration supplies the listed ≤1–5 µS/cm water for tasks needing reverse-osmosis water or a feed for further point-of-use treatment.
Adding analytical polishing after RO addresses tasks requiring further purification at the final supply stage, rather than RO water alone.
Enhanced polishing includes a specified TOC limit of ≤20 ppb, giving an additional selection criterion where organic background matters to the method.
PROCESS AND CONTROL
Media, activated-carbon and softening stages protect the RO plant from suspended solids, chlorine and hardness.
The final stage can be matched to routine washing, analytical preparation or biomedical work.
Level control, low-pressure protection, conductivity monitoring and scheduled circulation support stable unattended operation.
APPLICATION ENVIRONMENTS
Supplies glassware washing, sterilizer feed and general preparation.
The selected polishing stage supports absorption, emission and spectrophotometry preparation.
The enhanced configuration supports water-sensitive biomedical and chromatography tasks.
SYSTEM SELECTION
Assign routine RO, analytical and low-organic duties to the corresponding configuration before combining their demand into one central supply plan.
Coordinate the outlet layout, storage and peak consumption so the selected production capacity serves the rooms that will draw water together.
PROCUREMENT / INQUIRY
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